CASE STUDIES
Optimal etch recipe prediction for 3D NAND structures
Simulation and optimization of etch on flexible substrates for roll-to-roll processing
Predicting and optimizing etch recipes for across the Wafer uniformity
Minimum reaction network necessary to describe Ar/CF4 plasma etch
A model-based, Bayesian approach to the CF4/Ar etch of SiO2
A cellular automata simulation of atomic layer etching